Picosun Oy, a manufacturer of Atomic Layer Deposition (ALD) equipment for global industries, has reported the successful low temperature deposition of graphene, enabled by its PICOPLASMA™ remote plasma source system.
Only 400 oC deposition temperature, now demonstrated by an elite research group led by Prof. Wei Ren and Prof. Zuo-Guang Ye at Xi’an Jiaotong University, China, does not only widen the variety of graphene’s applications but the employment of ALD, already a well-known and widely used method in the semiconductor industry markedly facilitates the material’s penetration into modern micro- and nanoelectronics manufacturing.
“Groundbreaking results like the ones just obtained at Xi’an Jiaotong University naturally call for the latest, most cutting-edge technology and know-how on both ALD equipment manufacturing and process development. We at Picosun are proud that our four decades’ cumulative experience in ALD system design has contributed to this significant leap forwards in graphene manufacturing, paving its way to real, tangible products in e.g. next generation consumer electronics, medical, ICT, and space applications,“ summarizes Juhana Kostamo, Managing Director of Picosun.
Source: Picosun press release
